AMAT 0190-51546REV03 Semiconductor Chamber Mechanical Assembly

Product Brief Introduction AMAT 0190-51546REV03 is revision 03 precision mechanical assembly for Applied Materials semiconductor wafer vacuum chamber. It is installed inside plasma reaction chamber to support and locate process components for wafer etching or thin film deposition.
Tag:

Technical Specifications Operating Environment: High vacuum, halogen plasma corrosive atmosphere Operating Temperature: 10℃ ~ 220℃ Mounting: Bolt fastening assembly Surface Treatment: Precision polishing Cleanliness: Semiconductor fab cleanroom requirement Revision: REV03

Functional Features Precision mechanical support and positioning for chamber internal parts. Low particle and low outgassing material property. Resist plasma and corrosive process gas erosion. Optimized structure of REV03 for better thermal stability. Stable dimension under repeated heating and cooling cycles. Modular structure for fast on-site maintenance replacement.

Application Scenarios Applied Materials PVD, CVD and plasma etch vacuum chamber. Semiconductor wafer fabrication plasma processing equipment. Chamber internal fixture and supporting mechanical subsystem. Preventive maintenance spare assembly for Centura platform. Wafer thin film deposition and etching production tools.

Performance Parameters Vacuum tightness: Ultra low helium leak rate Surface roughness: Ultra-smooth precision machined surface Thermal stability: Improved anti-deformation design of REV03 Contamination control: Low outgassing under vacuum

Material Composition Base material: High purity aluminum alloy Surface treatment: Hard anodized anti-plasma coating Auxiliary sealing parts: High purity fluoropolymer

Structural Characteristics REV03 optimized integrated mechanical assembly. Built-in positioning pins and threaded mounting holes. Seal groove for vacuum sealing installation. Stress relieved structure to reduce thermal distortion. Standard mounting hole layout matching original chamber design.

Working Principle This assembly bears thermal and mechanical load inside vacuum chamber. REV03 version optimizes structural stress distribution, keeps accurate alignment of surrounding components and maintains vacuum tightness for stable plasma wafer processing.

Installation Requirements Complete cleaning and particle inspection inside ISO cleanroom. Check surface scratch, crack and seal integrity before assembly. Align positioning pins and mounting holes accurately. Tighten bolts following factory specified torque sequence. Run helium leak test after installation.




    Customers reviews

    There are no reviews yet.

    Be the first to review “AMAT 0190-51546REV03 Semiconductor Chamber Mechanical Assembly”

    Your email address will not be published. Required fields are marked *

    Search for products

    Back to Top
    Product has been added to your cart
    phone: +8613639522374
    to whats
    +8613639522374
    to whats
    +8613639522374
    email: anikaqx@gmail.com