AMAT 0190-49518 Semiconductor Chamber Mechanical Assembly

Product Brief Introduction AMAT 0190-49518 is a precision mechanical assembly for Applied Materials semiconductor wafer vacuum process chamber. It acts as supporting and positioning structure inside plasma reaction chamber for wafer etching or thin film deposition process.
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Technical Specifications Operating Environment: High vacuum, halogen plasma corrosive atmosphere Operating Temperature: 10℃ ~ 220℃ Mounting: Bolt fastening assembly Surface Treatment: Precision polishing Cleanliness: Semiconductor fab cleanroom requirement

Functional Features Provide mechanical support and precise positioning for chamber internal components. Low particle generation and low outgassing characteristic. Anti-corrosion against halogen plasma and process gas. Stable geometry under repeated thermal cycling. Vacuum sealing matching interface. Modular design for quick field replacement.

Application Scenarios Applied Materials PVD, CVD and plasma etch vacuum chamber. Semiconductor wafer fabrication plasma processing equipment. Chamber internal fixture and supporting mechanical subsystem. Preventive maintenance spare assembly for Centura and Endura platforms. Wafer thin film deposition and etching production tools.

Performance Parameters Vacuum tightness: Ultra low helium leak rate Surface roughness: Ultra-smooth machined surface Thermal stability: Minimal thermal deformation Contamination control: Low outgassing under vacuum

Material Composition Base material: High purity aluminum alloy Surface treatment: Hard anodized anti-plasma coating Auxiliary sealing parts: High purity fluoropolymer

Structural Characteristics Pre-assembled integrated mechanical assembly. Built-in positioning pins and threaded mounting holes. Seal groove for vacuum sealing installation. Stress relieved structure to reduce thermal distortion. Standard mounting hole layout matching original chamber.

Working Principle This assembly bears thermal and mechanical load inside vacuum chamber, keeps accurate alignment of surrounding process components and maintains vacuum tightness, providing stable plasma environment for wafer processing.

Installation Requirements Complete cleaning and particle inspection inside ISO cleanroom. Check surface scratch, crack and seal integrity before assembly. Align positioning pins and mounting holes accurately. Tighten bolts following factory specified torque sequence. Run helium leak test after installation.




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