AMAT 0190-37519 Semiconductor Chamber Mechanical Fixture

Product Brief Introduction AMAT 0190-37519 is a precision mechanical fixture for Applied Materials semiconductor wafer vacuum process equipment. It works inside plasma chamber to hold, support or position process components, with low particle performance for wafer fabrication.
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Technical Specifications Operating Environment: High vacuum, halogen plasma Operating Temperature: 10℃ ~ 210℃ Mounting: Bolt fixed fixture Surface Treatment: Precision polishing and passivation Cleanliness Level: Semiconductor fab standard

Functional Features Precise mechanical clamping and positioning for chamber internal parts. Low particle generation under thermal cycling. Resist erosion of corrosive process gas and plasma. Low outgassing under high vacuum environment. Dimensional stability under temperature fluctuation. Modular design for convenient replacement.

Application Scenarios Applied Materials PVD, CVD and etch process chamber. Wafer plasma processing equipment internal fixture assembly. Semiconductor fab preventive maintenance spare components. Centura platform vacuum chamber mechanical subsystem. Thin film deposition and wafer etching equipment.

Performance Parameters Leak performance: Meet high vacuum system leak requirement Particle control: Low particle release during equipment operation Dimensional repeatability: High precision positioning accuracy Chemical stability: Resist halogen plasma corrosion

Material Composition Base material: High purity aluminum alloy Surface treatment: Hard anodized anti-plasma coating Auxiliary seal: High purity fluoropolymer material

Structural Characteristics Monolithic precision machined fixture structure. Precision positioning features and threaded mounting holes. Built-in seal groove for vacuum sealing. Stress relieved structure to reduce thermal distortion. Compact structure to fit limited chamber inner space.

Working Principle The fixture clamps and positions core process components inside vacuum chamber. It maintains stable geometric position under thermal load, reduces friction particle generation and ensures vacuum environment integrity for stable wafer plasma processing.

Installation Requirements Complete cleaning and particle inspection inside cleanroom. Check fixture surface for scratch, crack and contamination. Align positioning pin and mounting holes precisely. Tighten bolts according to specified torque value. Conduct helium leak test after installation.




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