Precision flow range, standard electrical communication interface, high purity wetted material. Rated operating pressure and temperature for semiconductor process.
Real-time gas flow measurement and closed-loop control, high control accuracy, fast response to flow setpoint change.
Semiconductor CVD, PVD and etch tools, ultra high purity gas distribution systems.
High flow control accuracy, repeatability, low zero drift, excellent leak tightness.
Integrated sensor, control valve and control circuit, stainless steel gas path, metal sealing structure.
The sensor detects gas flow signal, the internal circuit compares measured value with setpoint, and adjusts control valve opening to keep gas flow stable.
Mount on vibration-free position. Complete gas leak test after installation. Wire power and signal cable according to pin definition.
Avoid particulate contamination in gas path. Prevent overpressure. Periodic calibration is recommended.
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