Material compatible with semiconductor process gas. Dimension and interface follow Brooks OEM standard. Suitable for ultra clean gas path system.
Precise gas flow regulation, low internal leakage, maintain stable gas supply to process chamber.
Semiconductor gas cabinet, thin film deposition equipment, etch tool gas delivery system.
High leak tightness, corrosion resistant, low particle generation, high precision flow characteristic.
Compact precision assembly, high purity wetted material, standard gas connection port.
The component adjusts gas flow rate through internal precision structure, delivering process gas at stable set flow to semiconductor reaction chamber.
Install in clean environment. Complete gas leak test after installation. Use proper torque for connection fittings.
Avoid over-tightening to prevent thread damage. Prevent particulate contamination inside gas path.
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