Technical Specifications
Full scale flow: 100 sccm. Calibration gas: Nitrogen (N₂). Control signal: 0-5V DC input. Output signal: 0-5V DC proportional to flow. Power supply: ±15V DC. Accuracy: ±1% of full scale. Repeatability: ±0.2% of full scale. Operating temperature range: 15°C to +35°C.
Functional Features
Thermal mass flow sensing provides true mass flow measurement independent of pressure and temperature. Integrated PID control loop maintains set flow rate. Linear analog output interface simplifies system integration. Multi-gas calibration capability supports different process gases. Compact all-metal construction suits vacuum and clean environments.
Application Scenarios
It is used in semiconductor process gas control, vacuum coating systems, chemical vapor deposition, gas mixing systems, leak detection equipment and laboratory process instrumentation.
Performance Parameters
Accuracy: ±1% full scale. Repeatability: ±0.2% full scale. Response time: <1 second. Turndown ratio: 100:1. Operating temperature range: 15°C to +35°C.
Material Composition
Body: 316L stainless steel. Sensor: platinum wound resistance elements. Seals: fluoroelastomer. Valve: stainless steel with elastomeric seal. Housing: anodized aluminum alloy.
Structural Characteristics
It features inline flow body with VCR face seal fittings, integrated control valve, on-board signal conditioning electronics, D-sub electrical connector, and compact low-profile package.
Working Principle
Gas flows through the sensor tube where two heated resistance elements measure temperature differential proportional to mass flow rate. The control circuit compares the flow signal to the setpoint and adjusts the proportional control valve to maintain the desired flow rate.
Installation Requirements
Install in orientation specified in manual for best accuracy. Leak check all connections after installation. Use particle filter upstream of the controller. Connect ±15V DC power with correct polarity. Allow thermal stabilization before use.
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